[A-5-3] Flash Lamp Anneal Technology for Effectively Activating Ion Implanted Si

T. Ito, T. Iinuma, A. Murakoshi, H. Akutsu, K. Suguro, T. Arikado, K. Okumura, M. Yoshioka, T. Owada, Y. Imaoka, H. Murayama, T. Kusuda (1.Process and Manufacturing Engineering Center, Semiconductor Company, Toshiba Corp., 2.Lamp Technology and Engineering Division, Ushio Inc., 3.Development Department for Electronics Equipment, Dainippon Screen MFG. Co. Ltd.)

https://doi.org/10.7567/SSDM.2001.A-5-3