Source/Drain Dopant Deactivation and Junction Degradation by Energetic Ions in Plasma Processes

Yukio Tamai; Tadahiro Ohmi

doi:https://doi.org/10.7567/SSDM.2001.A-6-5

[A-6-5] Source/Drain Dopant Deactivation and Junction Degradation by Energetic Ions in Plasma Processes

Yukio Tamai, Tadahiro Ohmi (1.Department of Electronic Engineering, Graduate School of Engineering, Tohoku University, 2.New Industry Creation Hatchery Center, Tohoku University)

https://doi.org/10.7567/SSDM.2001.A-6-5

2001 International Conference on Solid State Devices and Materials

[A-6-5] Source/Drain Dopant Deactivation and Junction Degradation by Energetic Ions in Plasma Processes