[A-6-5] Source/Drain Dopant Deactivation and Junction Degradation by Energetic Ions in Plasma Processes
Yukio Tamai, Tadahiro Ohmi
(1.Department of Electronic Engineering, Graduate School of Engineering, Tohoku University, 2.New Industry Creation Hatchery Center, Tohoku University)
https://doi.org/10.7567/SSDM.2001.A-6-5