[B-10-4] The Atomistic Origin of High Dielectric Constants of Ta2O5 Thin Film Deposited on Ru Electrodes

Tomoyuki Hamada, Takuya Maruizumi, Masahiko Hiratani (1.Advanced Research Laboratory, Hitachi Ltd., 2.Central Research Laboratory, Hitachi, Ltd.)

https://doi.org/10.7567/SSDM.2001.B-10-4