Interconnect Length Distribution in Si System ULSI

Naohiro Takagi; Hiyouko Shinoki; Tomohito Tsushima; Yoshisato Yokoyama; Kazuya Masu

doi:https://doi.org/10.7567/SSDM.2001.B-2-2

2001 International Conference on Solid State Devices and Materials

Sep 26, 2001 - Sep 28, 2001
Diamond Hotel, Tokyo, Japan

[B-2-2] Interconnect Length Distribution in Si System ULSI

Naohiro Takagi, Hiyouko Shinoki, Tomohito Tsushima, Yoshisato Yokoyama, Kazuya Masu (1.Precision and Intelligence Laboratory, Tokyo Institute of Technology)

https://doi.org/10.7567/SSDM.2001.B-2-2

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