[B-5-3] Characterization of the Co-Silicide Penetration Depth into the Junction Area

Hi-Deok Lee、Keun-Koo Kang、Myoung-Jun Jang、Joo-Hyoung Lee、Seong-Hyun Park、Key-Min Lee、Ki-Seok Yoon、Jung-Hoon Choi、Geun-Suk Park、Young-Jin Park (1.Dept. of Electronics Engineering, Chungnam National University、2.Dept. of Physics, Chungbuk National University、3.Memory R&D Division, Hynix Semiconductor Co.)

https://doi.org/10.7567/SSDM.2001.B-5-3