[B-6-1] Interfacial Silicon Emission in Dry Oxidation -the Effect of H and Cl

Masashi Uematsu, Hiroyuki Kageshima, Kenji Shiraishi (1.NTT Basic Research Laboratories, 2.Institute of Physics, Tsukuba University)

https://doi.org/10.7567/SSDM.2001.B-6-1