[B-6-3] High-Resolution Photoelectron Spectroscopy of Interfacial Nitrogen in Ultrathin Si Oxynitride Films

M. Oshima, J. H. Oh, K. Ono, H. Kiwata, K. Nakamura, M. Niwa, K. Usuda, N. Hirashita, H. W. Yeom, Y. D. Chung, H. J. Shin (1.Department of Applied Chemistry, The University of Tokyo, 2.Semiconductor Technology Academic Research Center, 3.ASSRC, Yonsei University, 4.Pohang Accelerator Laboratory, Pohang University of Science and Technology)

https://doi.org/10.7567/SSDM.2001.B-6-3