[B-6-6] Growth Processes and Electrical Characteristics of Silicon Nitride Films Formed on Si(100) by Radical Nitrogen

Hiroya Ikeda, Daisuke Matsushita, Shinya Naito, Kenji Ohmori Akira Sakai, Shigeaki Zaima, Yukio Yasuda (1.Department of Crystalline Materials Science, Graduate School of Engineering, Nagoya University, 2.Center for Cooperative Research in Advanced Science and Technology, Nagoya University)

https://doi.org/10.7567/SSDM.2001.B-6-6