[B-8-1] The Relation between Dielectric Constant and Film Composition of Ultra-Thin Silicon Oxynitride Films: Experimental Evaluation and Analysis of Nonlinearity

Naoki Yasuda, Kouichi Muraoka, Masahiro Koike, Hideki Satake (1.Advanced LSI Technology Laboratory, Toshiba Corporation)

https://doi.org/10.7567/SSDM.2001.B-8-1