A New Two-Step Round Oxidation STI Technology for Highly Reliable Flash Memory

Naoki Ueda; Yoshimitsu Yamauchi; Tadahiro Ohmi

doi:https://doi.org/10.7567/SSDM.2001.C-10-1

2001 International Conference on Solid State Devices and Materials

Sep 26, 2001 - Sep 28, 2001
Diamond Hotel, Tokyo, Japan

[C-10-1] A New Two-Step Round Oxidation STI Technology for Highly Reliable Flash Memory

Naoki Ueda, Yoshimitsu Yamauchi, Tadahiro Ohmi (1.Process Development Laboratory, Sharp Corporation, 2.New Industry Creation Hatchery Center, Tohoku University)

https://doi.org/10.7567/SSDM.2001.C-10-1

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