The Japan Society of Applied Physics

[C-3-4] Thinner SOI Using Plasma Hydrogenation

A. Y. Usenko, A. G. Ulyashin, W. N. Carr, W. R. Fahrner, A. V. Frantskevich, R. Job (1.Silicon Wafer Technologies Inc., 2.Hagen University, 3.Belarussian State Polytechnic Academy, 4.New Jersey Institute of Technology)

https://doi.org/10.7567/SSDM.2001.C-3-4