[C-6-2] Ultra-High Selectivity Sidewall-Spacer Etching and Contact Hole Etching Technologies for 0.1 μm FD-SOI Devices

Naokatsu Ikegami, Hideaki Matsuhashi, Jun Kanamori (1.VLSI R&D Center, Oki Electric Industry Co., Ltd.)

https://doi.org/10.7567/SSDM.2001.C-6-2