Reactive Ion Beam Etching of GaN and AlGaN for Nano-structure Fabrication Using Methane-Based Gas Mixtures

Makoto Endo; Zhi Jin; Seiya Kasai; Hideki Hasegawa

doi:https://doi.org/10.7567/SSDM.2001.D-6-6

[D-6-6] Reactive Ion Beam Etching of GaN and AlGaN for Nano-structure Fabrication Using Methane-Based Gas Mixtures

Makoto Endo, Zhi Jin, Seiya Kasai, Hideki Hasegawa (1.Research Center for Integrated Quantum Electronics and Graduate School of Electronics and Information Engineering Hokkaido University)

https://doi.org/10.7567/SSDM.2001.D-6-6

2001 International Conference on Solid State Devices and Materials

[D-6-6] Reactive Ion Beam Etching of GaN and AlGaN for Nano-structure Fabrication Using Methane-Based Gas Mixtures