[E-3-2] Atomistic Crystal Growth Process of Metal Oxide Electronics Materials: Theoretical Simulation Studies

Momoji Kubo, Toshiyuki Yokosuka, Hitoshi Kurokawa, Ken Suzuki, Seiichi Takami, Akira Miyamoto, Masashi Kawasaki, Mamoru Yoshimoto, Hideomi Koinuma (1.Department of Materials Chemistry, Graduate School of Engineering, Tohoku University, 2.Institute for Materials Research, Tohoku University, 3.Materials and Structures Laboratory, Tokyo Institute of Technology, 4.CREST-JST and Materials and Structures Laboratory, Tokyo Institute of Technology)

https://doi.org/10.7567/SSDM.2001.E-3-2