[E-6-2] N/Ge Co-Implantation into GaN for N-Type Doping

Yoshitaka Nakano、Tetsu Kachi、Takashi Jimbo (1.Toyota Central Research and Development Laboratories, Inc.、2.Department of Environmental Technology and Urban Planning、3.Research Center for Micro-Structure Devices, Nagoya Institute of Technology)

https://doi.org/10.7567/SSDM.2001.E-6-2