Comprehensive Understanding of Electron and Hole Mobility Limited by Surface Roughness Scattering in Pure Oxides and Oxynitrides Based on Correlation Function of Surface Roughness

Takamitsu Ishihara; Kazuya Matsuzawa; Mariko Takayanagi; Shin-ichi Takagi

doi:https://doi.org/10.7567/SSDM.2001.F-4-3

[F-4-3] Comprehensive Understanding of Electron and Hole Mobility Limited by Surface Roughness Scattering in Pure Oxides and Oxynitrides Based on Correlation Function of Surface Roughness

Takamitsu Ishihara, Kazuya Matsuzawa, Mariko Takayanagi, Shin-ichi Takagi (1.Advanced LSI Technology Laboratory, Research and Development Center, Toshiba corporation, 2.Semiconductor company, System LSI Division, Toshiba corporation)

https://doi.org/10.7567/SSDM.2001.F-4-3

2001 International Conference on Solid State Devices and Materials

[F-4-3] Comprehensive Understanding of Electron and Hole Mobility Limited by Surface Roughness Scattering in Pure Oxides and Oxynitrides Based on Correlation Function of Surface Roughness