[P-1-15] Ultrathin Silicon Oxynitride Layers with a Low Leakage Current Density Formed by Plasma Nitridation Using Low Energy Electron Impact and Chemical Oxidation
Masao Takahashi, Masafumi Tamura, Akira Asano, Osamu Maida, Hikaru Kobayashi
(1.The Institute of Scientific and Industrial Research, Osaka University)
https://doi.org/10.7567/SSDM.2001.P-1-15
