[B-1-3] Study on Densification and Oxidation Mechanism during PDA for Minimum EOT of Ultrathin CVD HfO2

Yoshinao Harada, Masaaki Niwa, Dim-Lee Kwong (1.ULSI Process Technology Development Center, Semiconductor Company, Matsushita Electric Industrial Co., Ltd., 2.Micro Electronics Research Center, The University of Texas at Austin)

https://doi.org/10.7567/SSDM.2002.B-1-3