The Japan Society of Applied Physics

[B-2-3] Effect of TEOS treatment on the properties of periodic nanoporous silica low-k film

Yoshiaki Oku、Kazuhiro Yamada、Norikazu Nishiyama、Shunsuke Tanaka、Korekazu Ueyama、Nobuhiro Hata、Takamaro Kikkawa (1.MIRAI Project, ASET、2.Graduate School of Engineering Science, Osaka University、3.MIRAI Project, ASRC, AIST、4.RCNS, Hiroshima University)

https://doi.org/10.7567/SSDM.2002.B-2-3