2002 International Conference on Solid State Devices and Materials

Sep 17, 2002 - Sep 19, 2002
Nagoya Congress Center, Nagoya, Japan

[B-3-2] Suppression of Silicidation in ZrO2/SiOx/Si Structure by Helium Annealing

Kouichi Muraoka (1.Advanced LSI Technology Laboratory, Toshiba Corporation)

https://doi.org/10.7567/SSDM.2002.B-3-2

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