[B-3-3] Improvement of electrical properties for high-κ dielectrics grown by MOCVD via cyclic remote plasma oxidation

Sadayoshi Horii, Masayuki Asai, Hironobu Miya Kazuhiko Yamamoto, and, Masaaki Niwa (1.Semiconductor Equipment System Laboratory, Hitachi Kokusai Electric Inc., 2.ULSI Process Technology Development Center, Matsushita Electric Industrial Co., Ltd.)

https://doi.org/10.7567/SSDM.2002.B-3-3