[B-5-4] Low temperature oxidation of Si(100) with ozone radicals: Chemical Reaction Mechanism and Surface Stress

T. Narushima、A. N. Itakura、M. Kitajima、K. Miki (1.Nanotechnology Research Institute (NRI), National Institute of Advanced Industrial Science and Technology (AIST)、2.Materials Engineering Laboratory and Nanomaterials Laboratory, National Institute for Materials Science (NIMS))

https://doi.org/10.7567/SSDM.2002.B-5-4