[B-7-3] Effect of CF4 Plasma Pretreatment on TiO2 High-k Dielectric Film

Tzu Yun Chang、Hsiao Wei Chen、Tan Fu Lei、Tien Sheng Chao、Chen Jung Wu (1.Department of Electronic Engineering National Chiao Tung University、2.Department of Electrophysics, National Chaio Tung University、3.National Nano Device Labs.)

https://doi.org/10.7567/SSDM.2002.B-7-3