High Selective Etching using HF/H2SO4 Solution

Mami SAITO; Hiroshi TOMITA; Kunihiro MIYAZAKI; Soichi NADAHARA

doi:https://doi.org/10.7567/SSDM.2002.B-8-1

2002 International Conference on Solid State Devices and Materials

2002年9月17日〜 2002年9月19日
Nagoya Congress Center, Nagoya, Japan

[B-8-1] High Selective Etching using HF/H2SO4 Solution

Mami SAITO、Hiroshi TOMITA、Kunihiro MIYAZAKI、Soichi NADAHARA (1.Process & Manufacturing Engineering Center, Semiconductor Company, Toshiba Corporation)

https://doi.org/10.7567/SSDM.2002.B-8-1

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