[B-8-4] Quantum Chemical Molecular Dynamics Simulation on the Plasma Etching Processes

Katsumi Sasata、Toshiyuki Yokosuka、Hitoshi Kurokawa、Seiichi Takami、Momoji Kubo、Akira Imamura、Tadashi Shinmura、Masaaki Kanoh、Akira Miyamoto (1.Department of Materials Chemistry, Graduate School of Engineering, Tohoku University、2.Hiroshima Kokusai Gakuin University、3.Corporate Manufacturing Engineering Center, Toshiba Corporation、4.New Industry Creation Hatchery Center, Tohoku University)

https://doi.org/10.7567/SSDM.2002.B-8-4