[C-2-4] Comparison Studies on Oxygen Diffusion Coefficients for ALD-Al2O3 and PLD-HfO2 Films using 18O Isotope

Toshihide Nabatame、Tetsuji Yasuda、Masayasu Nishizawa、Minoru Ikeda、Tsuyoshi Horikawa、Akira Toriumi (1.MIRAI Project, Association of Super-Advanced Electronics Technologies (ASET)、2.MIRAI Project, Advanced Semiconductor Research Center (ASRC), National Institute of Advanced Industrial Science and Technology (AIST)、3.Department of Materials Science School of Engineering, University of Tokyo)

https://doi.org/10.7567/SSDM.2002.C-2-4