[C-2-4] Comparison Studies on Oxygen Diffusion Coefficients for ALD-Al2O3 and PLD-HfO2 Films using 18O Isotope

Toshihide Nabatame, Tetsuji Yasuda, Masayasu Nishizawa, Minoru Ikeda, Tsuyoshi Horikawa, Akira Toriumi (1.MIRAI Project, Association of Super-Advanced Electronics Technologies (ASET), 2.MIRAI Project, Advanced Semiconductor Research Center (ASRC), National Institute of Advanced Industrial Science and Technology (AIST), 3.Department of Materials Science School of Engineering, University of Tokyo)

https://doi.org/10.7567/SSDM.2002.C-2-4