[LP14-1] A behavior of Xenon difluoride etching on poly-Silicon sacrificial layer for fabrication of MEMS device

Takeshi Taniguchi, Takashi Kinoshita, Koichi Ikeda (1.Sony Corporation, Semiconductor Network Company, Technology Development Group, 2.Emerging Devices Division, MEMS Department)

https://doi.org/10.7567/SSDM.2002.LP14-1