[LP9-2] Low/very low dose and multi-buried oxide layers SIMOX materials formed from appropriate dose-energy matches

Meng Chen、Xi Wang Xiang Wang、Yeming Dong、Xianghua Liu、Wangbin Yi、Jing Chen (1.Shanghai Simgui Technology Co., Ltd.、2.Shanghai Institute of Microsystem and Information Technology)

https://doi.org/10.7567/SSDM.2002.LP9-2