Uniform and Reproducible MOCVD of Pb(Zr,Ti)O3 Thin Films on 8&quot;φ Substrate for FeRAM Production

Takehito Jimbo; Masahiko Kajinuma; Takeshi Masuda; Takakazu Yamada; Hiroto Uchida; Masaki Uematsu; Koukou Suu; Michio Ishikawa

doi:https://doi.org/10.7567/SSDM.2002.P10-5

[P10-5] Uniform and Reproducible MOCVD of Pb(Zr,Ti)O3 Thin Films on 8"φ Substrate for FeRAM Production

Takehito Jimbo、Masahiko Kajinuma、Takeshi Masuda、Takakazu Yamada、Hiroto Uchida、Masaki Uematsu、Koukou Suu、Michio Ishikawa (1.ULVAC Inc., Institute for Semiconductor Technologies、2.ULVAC Inc., Semiconductor Equipment Division 1)

https://doi.org/10.7567/SSDM.2002.P10-5

2002 International Conference on Solid State Devices and Materials

[P10-5] Uniform and Reproducible MOCVD of Pb(Zr,Ti)O3 Thin Films on 8"φ Substrate for FeRAM Production