[P10-6] A Ferroelectric Sr2(Ta1-x,Nbx)2O7 with a Low Dielectric Constant by Plasma PVD and Oxygen Radical Annealing

Ichirou Takahashi, Hiroyuki Sakurai, Atsuhiko Yamada, Kiyoshi Funaiwa, Kentaro Hirai, Shinichi Urabe, Tetsuya Goto, Masaki Hirayama, Akinobu Teramoto, Shigetoshi Sugawa, Tadahiro Ohmi (1.Department of Electronic Engineering, Graduate School of Engineering, Tohoku University, 2.Specialty Products Division, UBE INDUSTRIES, LTD, 3.New Industry Creation Hatchery Center, Tohoku University)

https://doi.org/10.7567/SSDM.2002.P10-6