[P3-11] Theoretical Studies on the Realistic Low Concentration Doping in Silicon Semiconductors by Accelerated Quantum Chemical Molecular Dynamics Method

Toshiyuki Yokosuka、Katsumi Sasata、Hitoshi Kurokawa、Seiichi Takami、Momoji Kubo、Akira Imamura、Yoshiyuki Kitahara、Masaaki Kanoh、Akira Miyamoto (1.Department of Materials Chemistry, Graduate School of Engineering, Tohoku University、2.Hiroshima Kokusai Gakuin University、3.Corporate Manufacturing Engineering Center, Toshiba Corporation、4.New Industry Creation Hatchery Center, Tohoku University)

https://doi.org/10.7567/SSDM.2002.P3-11