The Japan Society of Applied Physics

[P3-13] A New Microwave-Excited Plasma Etching Equipment separated Plasma Excited Region from Etching Process Region

Tetsuya Goto、Masaki Hirayama、Makoto Moriguchi、Shigetoshi Sugawa、Tadahiro Ohmi (1.New Industry Creation Hatchery Center, Tohoku University、2.Graduate School of Engineering, Tohoku University)

https://doi.org/10.7567/SSDM.2002.P3-13