Direct Patterning of Low-k Dielectric Films using X-Ray Lithography

S. Kuroki; T. Kikkawa; H. Kochiya; S. Shishiguchi

doi:https://doi.org/10.7567/SSDM.2002.P3-23

2002 International Conference on Solid State Devices and Materials

2002年9月17日〜 2002年9月19日
Nagoya Congress Center, Nagoya, Japan

[P3-23] Direct Patterning of Low-k Dielectric Films using X-Ray Lithography

S. Kuroki、T. Kikkawa、H. Kochiya、S. Shishiguchi (1.Research Center for Nanodevices and Systems, Hiroshima University、2.Association of Super-Advanced Electron Technology)

https://doi.org/10.7567/SSDM.2002.P3-23

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