[P3-3] High Quality Silicon Oxide Film Formed by Diffusion Region PECVD and Oxygen Radical Treatment using Microwave-Excited High-Density Plasma
Hiroaki Tanaka, Zhong Chuanjie, Masaki Hirayama, Akinobu Teramoto, Shigetoshi Sugawa, Tadahiro Ohmi
(1.Graduate School of Engineering, Tohoku University, 2.New Industry Creation Hatchery Center, Tohoku University)
https://doi.org/10.7567/SSDM.2002.P3-3
