[P4-1] Local Leakage Current of HfO2 Thin Films Characterized by Conducting Atomic Force Microscopy

Hiroya Ikeda、Tomokazu Goto、Mitsuo Sakashita、Akira Sakai、Shigeaki Zaima、Yukio Yasuda (1.Department of Crystalline Materials Science, Graduate School of Engineering, Nagoya University、2.Center for Cooperative Research in Advanced Science and Technology, Nagoya University)

https://doi.org/10.7567/SSDM.2002.P4-1