Application of Thin Nano-Crystalline VN Barrier in Cu/VN/SiO2/Si Systems

Mayumi B. Takeyama; Kazumi Satoh; Takaomi Itoi; Masakazu Sakagami; Atsushi Noya

doi:https://doi.org/10.7567/SSDM.2002.P4-13

2002 International Conference on Solid State Devices and Materials

2002年9月17日〜 2002年9月19日
Nagoya Congress Center, Nagoya, Japan

[P4-13] Application of Thin Nano-Crystalline VN Barrier in Cu/VN/SiO2/Si Systems

Mayumi B. Takeyama、Kazumi Satoh、Takaomi Itoi、Masakazu Sakagami、Atsushi Noya (1.Kitami Institute of Technology, Dept. Electrical and Electronic Engineering)

https://doi.org/10.7567/SSDM.2002.P4-13

▲