[P4-2] Investigation of (HfO2)x(Al2O3)1-x on (100) Si by XPS--energy gap and band alignment

H. Y. Yu, M. F. Li, D. L. Kwong, B. J. Cho, J. S. Pan, C. H. Ang, J. Z. Zheng (1.Silicon Nano Device Lab, ECE Department, National University of Singapore, 2.Dept. Electrical and Computer Engineering, University of Texas at Austin, 3.Institute of Materials Research & Engineering, 4.Chartered Semiconductor Manufacturing Ltd.)

https://doi.org/10.7567/SSDM.2002.P4-2