[A-1-4] Screening Effect on Remote Coulomb Scattering due to impurities in Polysilicon Gate of MOSFET
Takamitsu Ishihara, Junji Koga, Shinichi Takagi, Kazuya Matsuzawa
(1.Advanced LSI Thechnology Laboratory, Research and Development Center,Toshiba corporation)
https://doi.org/10.7567/SSDM.2003.A-1-4