[A-7-4] Characterization of Soft Breakdown Effects for Post-deposition NH3 Plasma Treated HfO2 Gate Dielectrics

Jer Chyi Wang, De Ching Shie, Tan Fu Lei, Chung Len Lee (1.Department of Electronics Engineering, National Chiao Tung University)

https://doi.org/10.7567/SSDM.2003.A-7-4