[A-9-3] Characterization of Plasma Nitridation Impact on Lateral Extension Profile in 50nm N-MOSFET by Scanning Tunneling Microscopy

Hidenobu Fukutome、Takashi Saiki、Mitsuaki Hori、Takuji Tanaka、Ryou Nakamura、Hiroshi Arimoto (1.FUJITSU LABORATORIES LTD., Silicon technologies laboratories, Advanced CMOS technology lab.、2.FUJITSU LTD., Advanced LSI development div.)

https://doi.org/10.7567/SSDM.2003.A-9-3