[A-9-3] Characterization of Plasma Nitridation Impact on Lateral Extension Profile in 50nm N-MOSFET by Scanning Tunneling Microscopy

Hidenobu Fukutome, Takashi Saiki, Mitsuaki Hori, Takuji Tanaka, Ryou Nakamura, Hiroshi Arimoto (1.FUJITSU LABORATORIES LTD., Silicon technologies laboratories, Advanced CMOS technology lab., 2.FUJITSU LTD., Advanced LSI development div.)

https://doi.org/10.7567/SSDM.2003.A-9-3