[B-2-2] High performance PZT capacitor using highly crystalline SRO bottom electrode for Mbit FeRAM devices

Hiroshi Itokawa、Katsuaki Natori、Soichi Yamazaki、Gerhard Beitel、Koji Yamakawa (1.Semiconductor Company, Toshiba Corp.、2.Infineon Technologies Japan)

https://doi.org/10.7567/SSDM.2003.B-2-2