The Japan Society of Applied Physics

2003 International Conference on Solid State Devices and Materials

2003 International Conference on Solid State Devices and Materials

Sep 16, 2003 - Sep 18, 2003
Keio Plaza Inter-Continental Tokyo (Keio Plaza Hotel), Tokyo, Japan

[B-2-3] A novel chemical solution deposition method suitable for high-yield fabrication of 50 nm-thick SrBi2Ta2O9 capacitors

Yoshihito Kawashima, Hiroshi Ishiwara (1.Frontier Collaborative Research Center, Tokyo Institute of Technology)

https://doi.org/10.7567/SSDM.2003.B-2-3