[B-5-4] High Resolution Pattern Recording on Photosensitive Urethane-Urea Copolymer Film Surface by Laser Irradiation through Photo-mask

Yanlong Che、Okihiro Sugihara、Naomichi Okamoto、Masahiro Tomiki、Masaaki Tsuchimori、Osamu Watanabe (1.Shizuoka University, NEDO Technical Fellow, Center for Joint Research、2.Shizuoka University, Faculty of Engineering、3.Toyota Central Research and Development Laboratories Inc.、4.Professor O. Sugihara now is with Institute of Multidisciplinary Research for Advanced Materials, Tohoku University)

https://doi.org/10.7567/SSDM.2003.B-5-4