[B-7-4] High Quality Silicon Nitride Film Formed by Microwave-Excited Plasma Enhanced Chemical Vapor Deposition with Dual Gas Shower Head
Hiroaki Tanaka、Zhong Chuanjie、Yukio Hayakawa、Masaki Hirayama、Akinobu Teramoto、Shigetoshi Sugawa、Tadahiro Ohmi
(1.Graduate School of Engineering, Tohoku University、2.New Industry Creation Hatchery Center, Tohoku University)
https://doi.org/10.7567/SSDM.2003.B-7-4
