[B-8-3] Kinetics of Boron Activation by Flash Lamp Annealing

K. Yamashita、M. Noguchi、H. Nishimori、T. Ida、M. Yoshioka、T. Kusuda、T. Arikado、K. Okumura (1.Semiconductor Leading Edge Technologies, Inc.、2.Research and Development Center, Lamp Company, Ushio Inc.、3.Research and Development Center, Dainippon Screen MFG. Co. Ltd.、4.Research Center for Advanced Science and Technology, The University of Tokyo)

https://doi.org/10.7567/SSDM.2003.B-8-3