High-Speed Damage-Free Contact Hole Etching using Dual Shower Head Microwave-Excited High-Density Plasma Equipment

Tetsuya Goto; Hiroshi Yamauchi; Takeyoshi Kato; Akinobu Teramoto; Masaki Hirayama; Shigetoshi Sugawa; Tadahiro Ohmi

doi:https://doi.org/10.7567/SSDM.2003.B-8-4

[B-8-4] High-Speed Damage-Free Contact Hole Etching using Dual Shower Head Microwave-Excited High-Density Plasma Equipment

Tetsuya Goto, Hiroshi Yamauchi, Takeyoshi Kato, Akinobu Teramoto, Masaki Hirayama, Shigetoshi Sugawa, Tadahiro Ohmi (1.New Industry Creation Hatchery Center, Tohoku University, 2.Graduate School of Engineering, Tohoku University)

https://doi.org/10.7567/SSDM.2003.B-8-4

2003 International Conference on Solid State Devices and Materials

[B-8-4] High-Speed Damage-Free Contact Hole Etching using Dual Shower Head Microwave-Excited High-Density Plasma Equipment