High-Speed Damage-Free Contact Hole Etching using Dual Shower Head Microwave-Excited High-Density Plasma Equipment

Tetsuya Goto; Hiroshi Yamauchi; Takeyoshi Kato; Akinobu Teramoto; Masaki Hirayama; Shigetoshi Sugawa; Tadahiro Ohmi

doi:https://doi.org/10.7567/SSDM.2003.B-8-4

2003 International Conference on Solid State Devices and Materials

2003年9月16日〜 2003年9月18日
Keio Plaza Inter-Continental Tokyo (Keio Plaza Hotel), Tokyo, Japan

[B-8-4] High-Speed Damage-Free Contact Hole Etching using Dual Shower Head Microwave-Excited High-Density Plasma Equipment

Tetsuya Goto、Hiroshi Yamauchi、Takeyoshi Kato、Akinobu Teramoto、Masaki Hirayama、Shigetoshi Sugawa、Tadahiro Ohmi (1.New Industry Creation Hatchery Center, Tohoku University、2.Graduate School of Engineering, Tohoku University)

https://doi.org/10.7567/SSDM.2003.B-8-4

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